SMIC and VeriSilicon Announced Release of a Standard Design Platform for SMIC's 0.13um Low Leakage Process

SMIC and VeriSilicon Announced Release of a Standard Design Platform for SMIC's 0.13um Low Leakage Process

September 06, 2006

Library Release is Highly Optimized for Low Power, Low Leakage Applications

    SHANGHAI, China, Sept. 6 /Xinhua-PRNewswire/ --
VeriSilicon Holdings Co., Ltd. (VeriSilicon), a leading
world class ASIC design foundry, semiconductor library and
IP provider focusing on design and manufacturing services
for customers worldwide, and Semiconductor Manufacturing
International Corporation (SMIC) (NYSE: SMI; SEHK:
0981.HK), one of the leading foundry in the world jointly
announced today the release of VeriSilicon's Standard
Design Platform (SDP) for SMIC's 0.13um Low Leakage
process. The SDP includes memory compilers for single port
and dual port SRAM, Diffusion programmable ROM, Two-port
Register File Compiler, standard cell library and I/O cell
library. 

    This new SDP was optimized specifically for low leakage
and low power, and has been proven in silicon through SMIC's
0.13um Low Leakage Silicon Shuttle Prototyping Service. In
addition, the SDP supports industry-leading EDA tools,
including Cadence, Synopsys, Magma and Mentor Graphics.

    "Several hundred customers worldwide have used
VeriSilicon's Standard Design Platforms for their designs
and many complex, multi-million gates SoCs have achieved
first silicon success and started volume production,"
said Dr. Wayne Dai, chairman, President and CEO of
VeriSilicon. "We have developed low leakage and low
power technologies for this newly released SDP, optimized
specifically for SMIC 0.13um low leakage process; the
technology can significantly reduce IC power consumption
for optimal use in battery powered applications, such as
handheld devices."

    "We thank VeriSilicon, one of our strategic
partners' continuous great support in the advancement of
technology portfolio to serve our customers in China as
well as in the world," said Richard Chang, President
and CEO of SMIC. "At the fast moving speed of the
technology development, SMIC aims to work closely with
VeriSilicon to deliver the excellence of the cooperation to
the forefront of technology." 

    About SMIC

    SMIC (NYSE: SMI; SEHK: 981) is one of the leading
semiconductor foundries in the world and the largest and
most advanced foundry in Mainland China, providing
integrated circuit (IC) manufacturing service at 0.35mm to
90nm and finer line technologies. Headquartered in
Shanghai, China, SMIC operates three 200mm fabs in Shanghai
and one in Tianjin, and one 300mm fab in Beijing, the first
of its kind in Mainland China. SMIC has customer service
and marketing offices in the U.S., Italy, and Japan as well
as a representative office in Hong Kong. For additional
information, please visit http://www.smics.com .

    About VeriSilicon

    VeriSilicon Holdings Co., Ltd. is a leading world class
ASIC design foundry providing libraries, semiconductor IPs,
design and turnkey manufacturing services with multi-fab
capability and on process technologies down to 90nm.
VeriSilicon has achieved first silicon success and entered
volume production of many complex, multi-million gates SoCs
using the leading wafer foundries in APAC and China.
VeriSilicon has operations in US, China, Taiwan, Japan,
France, and Korea. Over 500 customers worldwide have
licensed VeriSilicon IPs and Standard Design Platforms. In
2005, VeriSilicon was ranked number three in Deloitte
Technology Fast 50 China, the top 50 fastest-growing
technology companies in China and number six in Deloitte
Fast 500 Asia Pacific, the top 500 fastest-growing
technology companies in Asia Pacific. VeriSilicon was also
named one of the Red Herring 100 Private Companies of Asia,
and selected as one of the EE Times 60 Emerging Startups.
For additional information, please visit
http://www.verisilicon.com .

     Safe Harbor Statements
     (Under the U.S. Private Securities Litigation Reform
Act of 1995)

     Certain statements contained in this press release,
such as statements regarding the ongoing cooperation
between SMIC and VeriSilicon, may be viewed as
"forward-looking statements" within the meaning
of Section 27A of the U.S. Securities Act of 1933, as
amended, and Section 21E of the U.S. Securities Exchange
Act of 1934, as amended. Such forward-looking statements
involve known and unknown risks, uncertainties and other
factors (including without limitation the actual results of
future cooperation between SMIC and VeriSilicon), which may
cause actual events, and/or the actual performance,
financial condition or results of operations of SMIC to be
materially different from any future performance, financial
condition or results of operations implied by such
forward-looking statements. Further information regarding
these risks, uncertainties and other factors is included in
the Company's annual report on Form 20-F filed with the U.S.
Securities and Exchange Commission (the "SEC") on
June 29, 2006 and such other documents that SMIC may file
with the SEC or The Stock Exchange of Hong Kong Limited
from time to time.

    For more information, please contact:

    SMIC Shanghai

     Reiko Chang
     SMIC Public Relations Department
     Tel:   [phone] x10544
     E-mail: [e-mail]

    SMIC Hong Kong

     Calvin Lau 
     Tel:   [phone] 
     Email: [e-mail]
	 
     Mei Fung Hoo
     Tel:   [phone]
     Email: [e-mail]

    VeriSilicon: 

     Federico Arcelli 
     Corporate VP, WW Marketing, VeriSilicon 
     Tel:   [phone] 
     Email: [e-mail]

SOURCE  VeriSilicon Holdings Co., Ltd.